• TEM Imaging And Analysis
    Transmission electron microscopy (TEM) has become an indispensable analytical instrument in the fields of materials and semiconductors. It is an electron optical instrument that uses a high-energy
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  • Advanced FIB & TEM For Wafers Analysis
    Advanced process wafer-level FIB sample preparation and TEM analysis services provide precise sample preparation and structural analysis solutions for advanced process chips by performing FIB sample
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  • DB-FIB (Dual-Beam Focused Ion Beam)
    GRGTEST Metrology provides professional dual-beam focused ion beam (DB-FIB) analysis services. Popular testing services include TEM sample sections for advanced processes (14 nm and below), FA
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  • Wafer Cleaving Equipment And SEM Imaging
    Wafer cleaving equipment and SEM imaging services are key technological supports for materials science, electronics industry and biomedical research, and are especially suitable for internal
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  • AFM (Atomic Force Microscopy) Analysis
    The Bruker Dimension ICON6 atomic force microscope supports 12 modes, including contact, tapping, and peak force tapping, to meet the testing needs of different samples and provide diverse testing
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  • Energy Dispersive Spectroscopy (EDS) Analysis
    EDS stands for Energy Dispersive Spectrometer, which is an X-ray energy dispersive spectroscopy analysis method. Its principle is based on the fact that different elements emit characteristic X-rays
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  • PFIB (Plasma Focused Ion Beam)
    Compared to traditional gallium-ion focused ion beam (Ga-FIB), PFIB utilizes a more powerful xenon (Xe) ion beam, achieving a maximum current of 2.5 μA at 30 keV energy, which increases its etching
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