DB-FIB (Dual-Beam Focused Ion Beam)

DB-FIB (Dual-Beam Focused Ion Beam)
Details:
GRGTEST Metrology provides professional dual-beam focused ion beam (DB-FIB) analysis services. Popular testing services include TEM sample sections for advanced processes (14 nm and below), FA hotspot analysis (including hotspot cross-sectional defect analysis captured by different methods such as OBIRCH), and conventional fixed-point cross-section machining.
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Description
Technical Parameters

Service Content/Scope and Testing Items

 

a. TEM Thin-Section Samples

An important application of dual-beam focused ion beam microscopy (DB-FIB) is the preparation of ultrathin samples for transmission electron microscopy (TEM). GRGTEST Metrology can provide the following testing items for this application:

 

Service Content

Test Item

Quotation Unit

Sample Type

Silicon (Si) Based Sample XS (Cross-section) Sample Preparation

Each (ea)

Advanced process chips at 14nm and below; chips at 28nm, 40nm, 55nm and above

Silicon (Si) Based Sample PV (Plan-view) Sample Preparation

Each (ea)

Advanced process chips at 14nm and below; chips at 28nm, 40nm, 55nm and above

Non-silicon Based Sample XS (Cross-section) Sample Preparation

Hour (h)

Non-silicon based samples, including Gallium Arsenide (GaAs), Gallium Nitride (GaN), Silicon Carbide (SiC), etc.

Non-silicon Based Sample PV (Plan-view) Sample Preparation

Hour (h)

Non-silicon based samples, including Gallium Arsenide (GaAs), Gallium Nitride (GaN), Silicon Carbide (SiC), etc.

Special Sample Preparation

Hour (h)

Various new material samples, including lithium battery materials, graphene electrode materials, etc.

 

b. FA Hotspot Cross-section Analysis

Test Item

Quotation Unit

Sample Type

FA Hotspot Cross-section Analysis (including hotspots captured by methods like OBIRCH; one-stop testing including hotspot capture is available)

Hour (h)

Semiconductor samples: Wafer, IC, components, MEMS, lasers, etc.

 

c. Conventional Cross-section Processing

Test Item

Quotation Unit

Sample Type

Targeted Cross-section Processing

Hour (h)

Semiconductor samples: Wafer, IC, components, PCB, MEMS, lasers, etc.;Other non-semiconductor samples

Non-targeted Cross-section Processing

Hour (h)

Semiconductor samples: Wafer, IC, components, PCB, MEMS, lasers, etc.;Other non-semiconductor samples

 

Testing Cycle

 

The standard testing cycle is 3 calendar days. For special requirements, we can provide quotes with different response times of 48h, 24h, and 12h.

 

Our Advantages

 

GRGTEST Measurement's team members possess relevant experience in advanced wafer manufacturing processes. We adhere to a customer-centric approach and are committed to providing accurate, timely, and comprehensive testing services.

GRGTEST Measurement is the largest state-owned third-party testing company listed in China. Our platform has a sound management mechanism and comprehensive full-process testing and analysis capabilities, enabling us to provide clients with timely and authoritative analysis for complete projects.

 

Sample Requirements

 

Anhydrous; samples must not contain any liquid components; stable under ion beam irradiation (some organic samples cannot be detected); dimensions generally not exceeding 10cm*10cm*5cm (length*width*height).

 

 

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